Semiconductor package substrate

ABSTRACT

A semiconductor package substrate structure includes a circuit board with a plurality of first connection pads formed on at least a surface thereof; conductive posts formed on the surfaces of the first connection pads; and an insulative protection layer formed on the surface of the circuit board and having openings formed to completely expose the conductive posts, the conductive posts protruding above the surface of the substrate, thereby the electrical connection between the conductive posts and a semiconductor chip is facilitated, and the quality and the reliability of subsequent packaging process are ensured.

FIELD OF THE INVENTION

The present invention relates to a semiconductor package substrate structure, and more particularly, to a method of forming conductive elements on electrical connection pads on the surface of a circuit board, for external electrical connection.

BACKGROUND OF THE INVENTION

In the current flip-chip techniques, a semiconductor chip of IC is provided with electrode pads and a circuit board is provided with connection pads corresponding to the electrode pads, and the solder structures or the structures made from other conductive adhesive materials are formed between the electrode pads of the semiconductor chip and the corresponding connection pads of the circuit board so as to provide electrical connection and mechanical connection between the semiconductor chip and the circuit board.

Referring to FIG. 1, a plurality of metallic bumps 11 are formed on electrode pads 121 of a semiconductor chip 12, and a plurality of pre-solder structures 13 are formed on connection pads 141 of a circuit board 14. The metallic bumps 11 of the semiconductor chip 12 are mounted to the pre-solder structures 13 of the circuit board 14 using the flip-chip technique, and then at an appropriate reflow temperature for melting the pre-solder structures 13, the pre-solder structures 13 are reflowed to the corresponding metallic bumps 11, and thereby the semiconductor chip 12 are electrically connected to the circuit board 14.

Referring to FIGS. 2A to 2D, FIGS. 2A to 2D are cross-sectional schematic views illustrating the formation of pre-solder structures on a circuit board according to a conventional method.

As shown in FIG. 2A, a circuit board 20 having connection pads 201 on a surface thereof is provided.

As shown in FIG. 2B, an insulative protection layer 21 (such as a solder mask layer) is formed on the surface of the circuit board 20, and the insulative protection layer 21 exposes the connection pads 201 by the exposure and the development processes.

As shown in FIG. 2C, an adhesive layer 22 is formed on the connection pads 201 on the surface of the circuit board 20, and an electroplating process or a printing process is further performed to form pre-solders 23. However, there still exist some problems in the flip-chip techniques. For example, as a substrate used for FCCSP (flip-chip chips scale package) is thin enough to be easily bended. In addition, a strip-shaped circuit board having a plurality of substrate units can cause problems such as complicated fabricating process of pre-solders, low production yield and long cycle time. Further, not the heights of all the pre-solders 23 on the connection pads 201 are at the same level (i.e., a part of the pre-solders 23′ is lower or higher than the normal pre-solders 23 and a height difference “e” exists therebetween).

As shown in FIG. 2D, in order to overcome the unevenness problem among the conductive elements 23 on the circuit board 20, a coining process is employed to level out all of the pre-solders 23 to the same height. However, the coining process cannot level out all of the pre-solders 23 at once. The process can only level out the pre-solders 23 parts by parts, which, however, is time-consuming and costly.

Referring to FIG. 3, FIG. 3 shows a schematic view of a semiconductor chip 31 being electrically connected to the circuit board 32. The circuit board 32 has connection pads 321 formed on surface thereof by the flip-chip technique. An insulative protection layer 33 is formed on the surface of the circuit board 32, and a plurality of openings 330 are formed in the insulative protection layer 33 so as to expose parts of surfaces of the connection pads 321. An adhesive layer 322 is formed on surfaces of the connection pads 321. However, the height of the adhesive layer 322 is still below the surface of the insulative protection layer 33. The semiconductor chip 31 has electrode pads 311 formed on a surface thereof. A metallic bump 34 is formed on surfaces of each of the electrode pads 311, so that the metallic bumps 34 of the semiconductor chip 31 correspond to the connection pads 321 of the circuit board 32. A reflow process is then performed to make the metallic bumps 34 electrically connected to the surfaces of the connection pads 321 of the circuit board 32.

However, the insulative protection layer 33 is not completely even (i.e., some part of the insulative protection layer 33 may be beyond or below the normal height of the insulative protection layer), and a height difference “e′” exists therebetween. As a result, the openings 330 are formed in the insulative protection layer 33 to expose the connection pads 321, so that the metallic bumps 34 of the semiconductor chip 31 are electrically connected with the connection pads 321. In this case, problems such as deviation or poor electrical connection between the semiconductor chip and the circuit board are likely to occur. These problems are particularly serious for non-solder mask defined (NSMD) products.

SUMMARY OF THE INVENTION

In view of the aforesaid drawbacks, it is therefore an objective of the invention to provide a semiconductor package substrate, wherein flat conductive posts are formed to ensure the reliability the subsequent packaging process.

It is another objective of the invention to provide a semiconductor package substrate, wherein conductive posts are formed with heights greater than that of the insulative protection layer so as to facilitate electrical connection to bumps of a semiconductor chip.

In accordance with the foregoing and other objectives, the invention proposes a semiconductor package substrate structure, comprising: a circuit board having a plurality of first connection pads formed on at least a surface thereof, conductive posts formed on surfaces of the first connection pads by electroplating; and an insulative protection layer formed on the surface of the circuit board and having openings formed to completely expose the conductive posts. The conductive posts protrude above the surface of the insulative protection layer to allow mounting of a semiconductor chip.

The semiconductor package substrate structure further comprises a conductive layer formed between the circuit board and the first connection pads. The conductive layer may be made up of one selected from the group consisting of Cu, Sn, Ni, Cr, Ti and Cu—Cr alloy, or a conductive polymer. Preferably, the conductive layer is made of copper foil or electroless copper.

Further, circuits and second connection pads may be formed on surface of the circuit board, and a conductive layer is formed between the circuit board and the circuits, the circuit board and the first connection pads, and the circuit board and the second connection pads.

The first connection pads are solder pads and conductive posts are formed on the surfaces of thereof, whereas the second connection pads are wire bonding pads and are below than the surface of the insulative protection layer. An adhesive layer may be formed on the surfaces of the conductive posts and the second connection pads to prevent oxidation of the conductive posts and the second connection pads, while improving the quality of electrical connection to other elements. Alternatively, conductive elements may be directly formed on the surfaces of the conductive posts.

The insulative protection layer is made up of a photosensitive dielectric material such as a solder mask. The photosensitive dielectric material is in the form of a dry film or liquid. The liquid photosensitive dielectric material is formed on the surface of the circuit board by a printing process or a non-printing process. The non-printing process can be one of roller coating, spray coating, dipping coating and spin coating. The dry-film photosensitive dielectric material is adhered onto surface of the circuit board. The insulative protection layer further comprises another opening for exposing the second connection pads.

Accordingly, the invention first forms a conductive layer on the surface of a circuit board, and then forms connection pads and conductive posts through the conductive layer by electroplating. After the conductive layer is removed, the invention forms an insulative protection layer on the surfaces of the circuit board and the conductive posts. Because the heights of the conductive posts are beyond the surface of the circuit board, the conductive posts can be completely exposed to be NSMD (Non-Solder Mask Defined) solder pads after the insulative protection layer is patterned. At the same time, the conductive posts protrude above the surface of the insulative protection layer. As a result, the conductive posts can easily be electrically connected to bumps of a semiconductor chip, and the quality and the reliability of the subsequent packaging process are ensured.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional schematic diagram of a conventional flip chip structure;

FIGS. 2A to 2D are cross-sectional schematic views illustrating the formation of pre-solder structures on a circuit board according to a conventional method;

FIG. 3 is a schematic view of a circuit board and a semiconductor chip being electrically connected to the circuit board using the flip-chip technology;

FIGS. 4A to 4I are cross-sectional schematic views illustrating a semiconductor package substrate according to the first embodiment of the invention;

FIG. 4I′ is another cross-sectional schematic view showing an alternative embodiment of FIG. 4I;

FIGS. 5A to 5I are cross-sectional schematic views illustrating a semiconductor package substrate according to the second embodiment of the invention;

FIG. 5I′ is a cross-sectional view showing an alternative embodiment of FIG. 5I;

FIGS. 6A to 6I are cross-sectional schematic views illustrating a semiconductor package substrate according to the third embodiment of the invention; and

FIGS. 7A to 7I are cross-sectional schematic views showing a semiconductor package substrate according to the fourth embodiment of the invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention is described in the following so that one skilled in the art can easily understand other advantages and effects of the invention.

First Embodiment

Referring to FIGS. 4A to 4I′, FIGS. 4A to 4I are cross-sectional schematic views illustrating a semiconductor package substrate according to the first embodiment of the invention.

As shown in FIG. 4A, a substrate 40 is first provided. Then, a conductive layer 41 is formed on the surface of the substrate 40. The conductive layer 41 may be made up of one from the group consisting of Cu, Sn, Ni, Cr, Ti and Cu—Cr alloy. Alternatively, the conductive layer 41 may be made up of a conductive polymer. Preferably, the electrical conducting layer 41 is made up of copper foil or electroless copper.

As shown in FIG. 4B, a first resistance layer 42 (such as a dry film or liquid photoresist) is formed on the surface of the conductive layer 41, and a plurality of openings 420 are formed in the first resistance layer 42 to expose parts of the conductive layer 41.

As shown in FIG. 4C, by using the conductive layer 41 as a current conductive path for electroplating, at least one of the first connection pads 43 a and the circuits 43 b are formed on the surface of the conductive layer 41 in the openings 420 of the first resistance layer 42, wherein the first connection pads 43 a function as solder pads in the subsequent process.

As shown in FIG. 4D, a second resistance layer 44 made up of a dry film or liquid photoresist is formed on the surfaces of the first resistance layer 42, the first connection pads 43 a and the circuits 43 b. Second openings 440 are formed in the second resistance layer 44 to expose the first connection pads 43 a, wherein the entire upper surfaces of the first connection pads 43 a are exposed from the openings 440 of the second resistance layer 44.

As shown in FIG. 4E, by using the conductive layer 41 as a current conductive path for electroplating, conductive posts 45 are formed on the surfaces of the first connection pads 43 a in the openings 440 of the second resistance layer 44.

As shown in FIG. 4F, the second resistance layer 44, the first resistance layer 42 and the conductive layer 41 covered by the first resistance layer 42 are removed by stripping or etching so as to completely expose the conductive posts 45. Because the technique used in the removal of the first resistance layer 42, the second resistance layer 44 and the electrical conducting layer 41 is well known in the art, detailed description thereof is thereafter omitted.

As shown in FIG. 4G, an insulative protection layer 46 is then formed on the surfaces of the substrate 40 and the conductive posts 45. The insulative protection layer 46 may be made up of a photosensitive dielectric material such as a solder mask layer. The photosensitive dielectric material may be in the form of liquid or a dry film. The liquid photosensitive dielectric material is formed on the surface of the circuit board 40 by a printing process or a non-printing process, wherein the non-printing process can be one of roller coating, spray coating, dipping coating and spin coating. The dry-film photosensitive dielectric material is adhered onto surface of the circuit board 40.

As shown in FIG. 4H, the insulative protection layer 46 is exposed and developed, such that openings 460 can be formed to completely expose the conductive posts 45 to be the NSMD solder pads. After the insulative dielectric layer 46 on surfaces of the conductive posts 45 is removed, the exposed conductive posts 45 have heights greater than that of the insulative protection layer 46, such that the conductive posts 45 protrude from surface of the insulative protection layer 46. The outer diameters of the conductive posts 45 are equal to those of the first connection pads 43 a.

As shown in FIG. 4I, an adhesive layer 48 is formed on the surfaces of the conductive posts 45. The adhesive layer 48 may be made up of a material selected from the group consisting of chemically deposited Ni/Au, chemically deposited Sn, chemically deposited Ni/Pd/Au, electroplated Ni/Au, electroplated Sn, electroplated Sn/Pb, organic solder protection (OSP) layer and direct immerging gold.

As shown in FIG. 4I′, the conductive elements 49 may be formed on surfaces of the conductive posts 45 by electroplating or printing to be electrically connect to other electronic devices. The conductive elements 49 are solder bumps, which may be made up of one selected from the group consisting of Sn, Sn—Ag alloy, An—Ag—Cu alloy, Sn—Pb alloy and Sn—Cu alloy.

The semiconductor package substrate of the invention comprises: a circuit board 40 having a plurality of first connection pads 43 a on at least a surface thereof, conductive posts 45 formed on the surfaces of the first connection pads 43 a; and an insulative protection layer 46 formed on the surface of the circuit board 40 and having openings 460 for completely exposing the conductive posts 45, the conductive posts 45 protrude above surface of the insulative protection layer 46 and have outer diameters equal to those of the first connection pads 43 a.

The semiconductor package substrate further comprises circuits 43 b and a conductive layer 41 formed among the circuit board 40, the first connection pads 43 a and the circuits 43 b. The conductive layer 41 may be made up of one selected from the group consisting of Cu, Sn, Ni, Cr, Ti and Cu—Cr alloy. Alternatively, the conductive layer 41 may be made up of a conductive polymer. The adhesive layer 48 is formed on the surfaces of the conductive posts 45. The adhesive layer 48 may be made up of a material selected from the group consisting of chemically deposited Ni/Au, chemically deposited Sn, chemically deposited Ni/Pd/Au, electroplated Ni/Au, electroplated Sn, electroplated Sn/Pb, organic solder protection (OSP) layer and direct immerging gold. Alternatively, conductive elements 49 are formed on surfaces of the conductive posts 45, which are solder bumps made of Sn, Sn—Ag alloy, Sn—Ag—Cu alloy, Sn—Pb alloy or Sn—Cu alloy.

Second Embodiment

Referring to FIGS. 5A to 5I′, FIGS. 5A to 5I are cross-sectional schematic views illustrating a semiconductor package substrate according to the second embodiment of the invention.

According to the embodiment, the fabricating process of FIGS. 5A to 5C is same as the fabricating process of FIGS. 4A to 4C, but the fabricating process of FIGS. 5D to 5I′ is different from the first embodiment. As shown in FIG. 5D, a second resistance layer 44 (such as a dry film or liquid photoresist) is formed on the surfaces of the first resistance layer 42, the first connection pads 43 a and the circuits 43 b, and a plurality of openings 440 are formed in the second resistance layer 44 to expose the first connection pads 43 a, wherein of the upper surfaces of the first connection pads 43 a are exposed from the openings 440 of the second resistance layer 44. As shown in FIGS. 5E to 5G, the conductive posts 45 are formed in the openings 440 of the second resistance layer 44 by electroplating, and the conductive posts 45 have outer diameters smaller than those of the first connection pads 43 a.

Third Embodiment

Referring to FIGS. 6A to 6I, FIGS. 6A to 6I are cross-sectional schematic views illustrating a semiconductor package substrate according to the third embodiment of the invention The difference between the third embodiment and the first as well as the second embodiments is that the first connection pads, the second connection pads and the circuits are formed on the surface of the circuit board.

As shown in FIG. 6A, the circuit board 40 is first provided, and then the conducting layer 41 is formed on the surface of the circuit board 40.

As shown in FIG. 6B, the first resistance layer 42 is formed on the surface of the conductive layer 41 and the openings 420 are formed in the first resistance layer 42 to expose parts of the conductive layer 41.

As shown in FIG. 6C, by using the conductive layer 41 as a current conductive path for electroplating, the first electrical connection pads 43 a, the circuits 43 b and the second connection pads 43 c are formed on the surface of the conductive layer 41 in the openings 420 of the first resistance layer 42, wherein the first connection pads 43 a are used as solder pads and the second connection pads 43 c are used as wire bonding pads in subsequent process.

As shown in FIG. 6D, the second resistance layer 44 is formed on the surfaces of the first resistance layer 42, the first connection pads 43 a, the circuits 43 b and the second connection pads 43 c. The openings 440 are formed in the second resistance layer 44, such that only the first connection pads 43 a are exposed through the openings 440, wherein the entire upper surfaces of the first connection pads 43 a are completely exposed from the openings 440.

As shown in FIG. 6E, the conductive posts 45 are formed on the surfaces of the first connection pads 43 a in the openings 440 by using the conductive layer 41 as a current conductive path for electroplating.

As shown in FIG. 6F, the second resistance layer 44, the first resistance layer 42 and the electrical conducting layer 41 covered by the first resistance layer 42 are completely removed by stripping or etching, thereby the conductive posts 45, the circuits 43 b and the second connection pads 43 c are completely exposed.

As shown in FIG. 6G, the insulative protection layer 46 is formed on the surfaces of the circuit board 40, the conductive posts 45 and the second connection pads 43 c. The insulative protection layer 46 is made up of a photosensitive dielectric material such as a solder mask. The photosensitive dielectric material may be in the form of a dry film or liquid, wherein the liquid photosensitive dielectric material can be formed on the surface of the circuit board 40 by a printing process or a non-printing process. The non-printing method may be one of the following methods: roller coating, spray coating, dipping coating and spin coating; the dry-film photosensitive dielectric material can be directly adhered onto the surface of the circuit board 40.

As shown in FIG. 6H, the insulative protection layer 46 is exposed and developed, so as to form openings 460 to completely expose the conductive posts 45 and the second connection pads 43 c. The heights of the conductive posts 45 are beyond the surface of the insulative protection layer 46, and protrude above surface of the insulative protection layer 46. The conductive posts 45 have outer diameters equal to those of the first connection pads 43 a; the second connection pads 43 c are lower than the surface of the insulative protection layer 46.

As shown in FIG. 6I, an adhesive layer 48 is formed on the surfaces of the conductive posts 45 and the second connection pads 43 c, wherein the adhesive layer 48 may be made up of chemically deposited Ni/Pd/Au or Ni/Au.

Accordingly, the semiconductor package substrate comprises: a circuit board 40 having a plurality of first connection pads 43 a and second connection pads 43 c on at least a surface thereof, conductive posts 45 formed on the surfaces of the first connection pads 43 a; and an insulative protection layer 46 formed on the surface of the circuit board 40 and having openings 460 for completely exposing the conductive posts 45 and the second connection pads 43 c, the conductive posts 45 protruding above the surface of the insulative protection layer 46.

The semiconductor package substrate further comprises circuits 43 b. The first connection pads 43 a function as solder pads with the conductive posts 45 formed thereon, whereas the second connection pads 43 c function as wire bonding pads. The semiconductor package substrate further comprises the conductive layer 41 formed between the circuit board 40 and the first connection pads 43 a, the second connection pads 43 c and the circuits 43 b. An adhesive layer 48 is formed on the surfaces of the conductive posts 45 and the second connection pads 43 c, wherein the adhesive layer 48 may be made of chemically deposited Ni/Pd/Au or Ni/Au.

Fourth Embodiment

Referring to FIGS. 7A to 7I, FIGS. 7A to 7I are cross-sectional schematic views illustrating a semiconductor package substrate according to the fourth embodiment of the invention.

The fabricating process and the structure of FIGS. 7A to 7C is same as the fabricating process of FIGS. 6A to 6C, but the fabricating process of FIGS. 7D to 7I is different from the third embodiment. As shown in FIG. 7D, the second resistance layer 44 (such as a dry film or liquid photoresist) is formed on the surfaces of the first resistance layer 42, the first connection pads 43 a, the circuits 43 b and the second connection pads 43 c. The openings 440 are formed in the second resistance layer 44 to expose the first connection pads 43 a, wherein only parts of the upper surface of the first connecting pad 43 a are exposed from the openings 440 of the second resistance layer 44. As shown in FIGS. 7E to 7I, the conductive posts 45 are formed in the openings 440 of the second resistance layer 44 by electroplating. The outer diameters of the conductive posts 45 are smaller than those of the first connection pads 43 a.

Accordingly, the invention first forms a conductive layer on the surface of a circuit board, and then forms circuits, first connection pads and conductive posts (or even second electrical connection pads) by using the conductive layer as a current conductive path for electroplating. After removing the conductive layer, the invention forms an insulative protection layer on the surfaces of the circuit board and the conductive posts. Openings are formed in the insulative protection layer to completely expose the conductive posts. Therein, the conductive posts protrude above the surface of the insulative protection layer and are NSMD solder pads. Because the heights of the conductive posts are beyond the surface of the insulative protection layer, the conductive posts may easily be electrically connected to bumps of a semiconductor chip, and the quality and the reliability of subsequent packaging process are ensured.

The invention has been described using exemplary preferred embodiments. However, it is to be understood that the scope of the invention is not limited to the disclosed embodiments. On the contrary, it is intended to cover various modifications and similar arrangements. The scope of the claims, therefore, should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements. 

1. A semiconductor package substrate, comprising: a circuit board having a plurality of first connection pads formed on at least a surface thereof; a plurality of conductive posts formed on the surfaces of the corresponding first connection pads by electroplating; and an insulative protection layer formed on the surface of the circuit board and having openings formed to completely expose the conductive posts, the conductive posts protruding above surface of the insulative protection layer to allow mounting of a semiconductor chip.
 2. The semiconductor package substrate as claimed in claim 1, wherein the circuit board further comprises a plurality of circuits formed on a surface thereof.
 3. The semiconductor package substrate as claimed in claim 1, wherein the outer diameters of the conductive posts are equal to or smaller than those of the first connection pads.
 4. The semiconductor package substrate as claimed in claim 1, wherein the first connection pads are solder pads.
 5. The semiconductor package substrate as claimed in claim 1, wherein the insulative protection layer is made up of a photosensitive dielectric material.
 6. The semiconductor package substrate as claimed in claim 5, wherein the photosensitive dielectric material is in the form of a dry film or liquid.
 7. The semiconductor package substrate as claimed in claim 1, further comprising an adhesive layer formed on the surfaces of the conductive posts.
 8. The semiconductor package substrate as claimed in claim 7, wherein the adhesive layer is made up of a material selected from the group consisting of chemically deposited Ni/Au, chemically deposited Sn, chemically deposited Ni/Pd/Au, electroplated Ni/Au, electroplated Sn, electroplated Sn/Pb, organic solder protection (OSP) layer and direct immerging gold.
 9. The semiconductor package substrate as claimed in claim 1, further comprising a plurality of conductive elements formed on the surfaces of the conductive posts.
 10. The semiconductor package substrate as claimed in claim 9, wherein the conductive elements are solder bumps.
 11. A semiconductor package substrate, comprising: a circuit board having a plurality of first connection pads and second connection pads formed on at least a surface thereof; a plurality of conductive posts formed on the surfaces of the first connection pads by electroplating; and an insulative protection layer formed on the surface of the circuit board, and having openings formed to completely expose the conductive posts, the conductive posts protruding above the surface of the insulative protection layer to allow mounting of a semiconductor chip, and the insulative protection layer further having openings formed for exposing the second connection pads.
 12. The semiconductor package substrate as claimed in claim 11, wherein circuits are formed on the surface of the circuit board.
 13. The semiconductor package substrate as claimed in claim 11, wherein the outer diameters of the conductive posts are equal to or smaller than those of the first connection pads.
 14. The semiconductor package substrate as claimed in claim 11, wherein the first connection pads are solder pads.
 15. The semiconductor package substrate as claimed in claim 11, wherein the second connection pads are wire bonding pads, which are lower than the surface of the insulative protection layer.
 16. The semiconductor package substrate as claimed in claim 11, wherein the insulative protection layer is made up of a photosensitive dielectric material.
 17. The semiconductor package substrate as claimed in claim 16, wherein the photosensitive dielectric material is in the form of a dry film or liquid.
 18. The semiconductor package substrate as claimed in claim 11, further comprising an adhesive layer formed on the surfaces of the conductive posts and the second connection pads.
 19. The semiconductor package substrate as claimed in claim 18, wherein the adhesive layer is made of a material selected from the group consisting of chemically deposited Ni/Au, chemically deposited Sn, chemically deposited Ni/Pd/Au, electroplated Ni/Au, electroplated Sn, electroplated Sn/Pb, organic solder protection (OSP) layer and direct immerging gold.
 20. The semiconductor package substrate of claim 11, further comprising a plurality of conductive elements formed on the surfaces of the conductive posts.
 21. The semiconductor package substrate of claim 20, wherein the conductive elements are solder bumps. 